Sapphire Substrate Polishing Slurry
Sapphire Substrate Polishing Slurry
Sapphire wafer is the most widely used substrate material in the semiconductor lighting industry, we developed Silica Colloidal and Alumina Slurry for sapphire substrate polishing.
Kona's Sapphire Substrate Polishing Slurry is designed to meet the demanding requirements of polishing sapphire substrates. Our colloidal silica slurries provide a superior surface finish with no compromise on polishing rates. With high-purity raw materials, our alumina slurries are idealy designed for C-plane sapphire with a fast removal rate and controlled surface finish. The slurry range is available in a wide range of particle sizes to cater to different polishing needs, including fine and rough polishing. Additionally, our Sapphire Substrate Polishing Slurry is compatible with various polishing machines and pads and provides cost-effective solutions for sapphire substrate polishing.
SAPPHIRE SUBSTRATE POLISHING SLURRY FEATURES
Sapphire Substrate is a kind of extremely hard semiconductor substrates, Kona engineering developed Sphere Substrate Polishing Slurry, including colloidal silica and alumina slurry.
In most cases, diamond abrasives is used for sapphire grading. However, which leaves scratches and other strains on the sapphire surface. So sapphire substrates need to be polished use colloidal silica or alumina slurry.
Kona sapphire colloidal silica polishing suspension especially developed for Sapphire, with increased abrasive particle size, which can improve the removal rate as well as no compromise with high quality surface.
Our aluminium rough and final polishing slurry developed for C- Plane Sapphire, with a fast removal rate and controlled surface finish.
DETAILS OF SAPPHIRE SUBSTRATE POLISHING SLURRY
Sapphire substrate is currently the mainstream substrate used for UV LED. Common size of sapphire substrates are 2", 4" and 6". Sapphire substrate has the characteristics of good light transmittance, high temperature resistance, corrosion resistance and high commercialization maturity.
Kona developed silica colloidal for sapphire substrate final polishing, also provides alumina slurry for sapphire substrate rough and final polishing.
Pro Name |
Silica colloidal for sapphire |
Base Abrasive |
Silica Colloidal |
Appearance |
White liquid |
PH |
9-12 |
Solvent Type |
Water-based |
Shelf Life |
12 months |
Pro Name |
C-plane sapphire polishing slurry |
Base Abrasive |
Alumina |
Appearance |
White slurry |
PH |
9-14 |
Solvent Type |
Water-based |
Shelf Life |
12 months |
Personne à contacter : Kona Kona, +18 3 90 90 84 73
Bonne affaire : acheter au vendeur
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Cette page concerne les importateurs et exportateurs de Sapphire Substrate Polishing Slurry Rechercher dans la catégorie : Divers Rechercher dans la catégorie : polishing, slurry, substrate, sapphire |
Vendredi 16 mai 2014
Quantité : 500000pcs - Prix : $1-25/pc
SLA et SLS Pourquoi utiliser stéréo lithographie? Stéréo lithographie est très similaire à la sls( frittage laser sélectif) processus de prototypage. Il est préférable d'utiliser sla, quand finition de surface et l'apparence générale directement de la machine est le facteur le...
Xiamen Karo Co.,Ltd
- karoplastic
- 361002 - Xiamen
- 0086 592 5135406
Vendredi 16 mai 2014
Quantité : 500000pcs - Prix : $1-25/pc
SLA et SLS Pourquoi utiliser stéréo lithographie? Stéréo lithographie est très similaire à la sls( frittage laser sélectif) processus de prototypage. Il est préférable d'utiliser sla, quand finition de surface et l'apparence générale directement de la machine est le facteur le...
Xiamen Karo Co.,Ltd
- karoplastic
- 361002 - Xiamen
- 0086 592 5135406
Vendredi 16 mai 2014
Quantité : 50000pcs - Prix : $1-25/pc
SLA et SLS Pourquoi utiliser stéréo lithographie? Stéréo lithographie est très similaire à la sls( frittage laser sélectif) processus de prototypage. Il est préférable d'utiliser sla, quand finition de surface et l'apparence générale directement de la machine est le facteur le...
Xiamen Karo Co.,Ltd
- karoplastic
- 361002 - Xiamen
- 0086 592 5135406